Under solid (grey), liquid (blue) and vapor states (white) along the equilibrium curves
Critical Point
Triple Point
Calculate a liquid or gas volume or a mass
At boiling point at 1.013 bar
in standard conditions (1,013 bar, 15°C)
Examples of uses of this molecule in Industry and Healthcare
In silicon thin film photovoltaic, semiconductor and display fabrication, nitrogen trifluoride is used as a fluorine source to clean Chemical Vapor Deposition (CVD) reactors. It is also a selective reagent for silicon dioxide etching.
Electronic componentsInformation to safely use this molecule
Moldy
Recommendations : Air Liquide has gathered data on the compatibility of gases with materials to assist you in evaluating which materials to use for a gas system. Although the information has been compiled from what Air Liquide believes are reliable sources (International Standards: Compatibility of cylinder and valve materials with gas content; Part 1- Metallic materials: ISO11114-1 (March 2012), Part 2 - Non-metallic materials: ISO11114-2 (April 2013), it must be used with extreme caution and engineering judgement. No raw data such as these can cover all conditions of concentration, temperature, humidity, impurities and aeration. It is therefore recommended that this table is only used to identify possible materials for applications at high pressure and ambient temperature. Extensive investigation and testing under the specific conditions of use need to be carried out to validate a material selection for a given application. Contact the regional Air Liquide team for expertise service.
General information
After first attempting the synthesis in 1903, Otto Ruff obtained nitrogen trifluoride by the electrolysis of a molten mixture of ammonium fluoride